低损耗氮化硅薄膜

产品描述

氮化硅光学薄膜具有宽的透明窗口，在薄膜光学、集成光子器件、非线性光学等领域有着重要应用

提供定制化服务，在保证高品质的同时对薄膜应力进行管理，可以提供定制化薄膜厚度（20-800nm）生长

尺寸	Si层规格	SiO2规格	Si3N4规格	Si3N4 沉积工艺
4 inch	Diameter:4″-100mm Material: Silicon Type/Dopant:P/Boron Orientation:(100) Resistivity: 1-20 ohm-cm Thickness:525 ± 25um Surface: SSP	3um	<=400nm	LPCVD
4 inch	Diameter:4″-100mm Material: Silicon Type/Dopant:P/Boron Orientation:(100) Resistivity: 1-20 ohm-cm Thickness:525 ± 25um Surface: SSP	3um	400nm-800nm	LPCVD
6 inch	Diameter:6″-150mm Material: Silicon Orientation:(100) Thickness:625 ± 10um Surface: SSP	3um	<=400nm	LPCVD
6 inch	Diameter:6″-150mm Material: Silicon Orientation:(100) Thickness:625 ± 10um Surface: SSP	3um	400nm-800nm	LPCVD
4 inch	Diameter:4″-100mm Material: Silicon Type/Dopant:P/Boron Orientation:(100) Resistivity: 1-20 ohm-cm Thickness:525 ± 25um Surface: SSP	6um	200nm	LPCVD
6 inch	Diameter:6″-150mm Material: Silicon Orientation:(100) Thickness:625 ± 10um Surface: SSP	6um	200nm	LPCVD